Effect of Concentration Variation on Optical and Structural Properties of TiO2 Thin Films

Sabastine Chinedu Ezike

doi:10.21467/jmm.7.1.1-6

Authors

Sabastine Chinedu Ezike Department of Physics, Modibbo Adama University of Technology, Yola, Adamawa State

DOI:

https://doi.org/10.21467/jmm.7.1.1-6

Abstract

Concentrations in weight percent (5- 25 wt %) of TiO₂ films used to optimize the film formation. The TiO₂films on glass substrates successfully obtained by spin-coating process using TiO₂nanopowder as precursor. Ultraviolet-Visible (UV-Vis), Scanning Electron Microscopy (SEM) equipped with Electron Diffraction X-ray (EDX) and X-ray Diffractometer (XRD) techniques used to characterize the films. The result of electron transport material (TiO₂) showed that film prepared from 15 wt % of TiO₂ solution and annealed at 450 has highest transmittance at visible light region with indirect optical band gap of 3.24 eV which corresponds to wavelength of 382 nm whereas 20 wt % has indirect band gap of 2.99 nm equivalent to 414.7 nm . The chemical analysis from Electron Diffraction Spectroscopy (EDS) of the material shows titanium and oxygen present at L and K-shells, respectively. The sample crystallized with preferred orientation at (101) from XRD analysis.

Keywords:

TiO2, Thin Film, Electron Transport Material, Spin coating, concentration variation

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